Invention Grant
- Patent Title: Semiconductor device and manufacturing method thereof
- Patent Title (中): 半导体装置及其制造方法
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Application No.: US11692596Application Date: 2007-03-28
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Publication No.: US08736047B2Publication Date: 2014-05-27
- Inventor: Hideaki Yoshimi , Mitsuo Umemoto , Kazumi Onda , Kazumi Horinaka
- Applicant: Hideaki Yoshimi , Mitsuo Umemoto , Kazumi Onda , Kazumi Horinaka
- Applicant Address: US AZ Phoenix
- Assignee: Semiconductor Components Industries, LLC
- Current Assignee: Semiconductor Components Industries, LLC
- Current Assignee Address: US AZ Phoenix
- Priority: JP2006-091170 20060329
- Main IPC: H01L23/10
- IPC: H01L23/10 ; H01L23/34 ; H01L23/367

Abstract:
A semiconductor device includes: a semiconductor substrate; a heat sink mounted on an upper surface of the semiconductor substrate; wirings formed on a lower surface of the semiconductor substrate; and the like. The heat sink is mounted on the upper surface of the semiconductor substrate, and a planar size thereof is approximately the same as that of the semiconductor substrate. Moreover, the heat sink has a thickness of 500 μm to 2 mm, and may be formed to be thicker than the semiconductor substrate. By using the heat sink to reinforce the substrate, a thickness of the semiconductor substrate can be reduced to, for example, about 50 μm. As a result, a thickness of the entire semiconductor device can be reduced.
Public/Granted literature
- US20070228554A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2007-10-04
Information query
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