A semiconductor device includes a first insulating layer; a wiring layer formed on a first surface of the first insulating layer and including a first electrode pad; a semiconductor chip; a second insulating layer including a semiconductor chip accommodating portion; a third insulating layer on the second insulating layer; and a passive element including an electrode and formed of an embedded portion and a protruding portion on a second surface of the first insulating layer, wherein an end surface of the embedded portion is coated by the insulating layer, the electrode of the passive element is electrically connected to the wiring layer through a via wiring formed in the insulating layers, the first electrode pad is electrically connected to another semiconductor device through a joining portion, and a protruding amount of the protruding portion is less than a gap between the second surface and the another semiconductor device.