Invention Grant
- Patent Title: Electron beam generating apparatus
- Patent Title (中): 电子束发生装置
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Application No.: US13122109Application Date: 2010-08-10
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Publication No.: US08736169B2Publication Date: 2014-05-27
- Inventor: Yong Woon Park , Sung Ju Park , In Soo Ko , Chang Bum Kim , Ju Ho Hong , Sung Ik Moon
- Applicant: Yong Woon Park , Sung Ju Park , In Soo Ko , Chang Bum Kim , Ju Ho Hong , Sung Ik Moon
- Applicant Address: KR Gyeongsangbuk-Do
- Assignee: Postech Academy-Industry Foundation
- Current Assignee: Postech Academy-Industry Foundation
- Current Assignee Address: KR Gyeongsangbuk-Do
- Agency: McCarter & English, LLP
- Agent David R. Burns
- Priority: KR10-2009-0077796 20090821
- International Application: PCT/KR2010/005236 WO 20100810
- International Announcement: WO2011/021802 WO 20110224
- Main IPC: H01J29/80
- IPC: H01J29/80
Abstract:
An apparatus for generating an electron beam is disclosed to reduce emittance of an electron beam. The apparatus includes: a housing including a rear portion where an electron beam is generated, a front portion having an electron beam discharge hole for discharging the electron beam to the exterior, and a side portion connecting the rear portion and the front portion, the side portion having a first hole and an opposite side portion, facing the first hole, having a second hole in order to reduce asymmetry of an electric field caused by the first hole; and a waveguide installed on the side portion to supply an electromagnetic wave to the interior of the housing through the first hole, wherein the electron beam is generated by laser incident to the interior of the housing and accelerated by the electromagnetic wave supplied to the interior of the housing.
Public/Granted literature
- US20120133281A1 ELECTRON BEAM GENERATING APPARATUS Public/Granted day:2012-05-31
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