Invention Grant
US08736177B2 Compact RF antenna for an inductively coupled plasma ion source
有权
用于电感耦合等离子体离子源的紧凑型RF天线
- Patent Title: Compact RF antenna for an inductively coupled plasma ion source
- Patent Title (中): 用于电感耦合等离子体离子源的紧凑型RF天线
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Application No.: US12894779Application Date: 2010-09-30
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Publication No.: US08736177B2Publication Date: 2014-05-27
- Inventor: Shouyin Zhang
- Applicant: Shouyin Zhang
- Applicant Address: US OR Hillsboro
- Assignee: FEI Company
- Current Assignee: FEI Company
- Current Assignee Address: US OR Hillsboro
- Agency: Scheinberg & Assoc., PC
- Agent Michael O. Scheinberg
- Main IPC: H01J7/24
- IPC: H01J7/24

Abstract:
An inductively coupled plasma ion source for a focused ion beam (FIB) system is disclosed, comprising an insulating plasma chamber with a feed gas delivery system, a compact radio frequency (RF) antenna coil positioned concentric to the plasma chamber and in proximity to, or in contact with, the outer diameter of the plasma chamber. In some embodiments, the plasma chamber is surrounded by a Faraday shield to prevent capacitive coupling between the RF voltage on the antenna and the plasma within the plasma chamber. High dielectric strength insulating tubing is heat shrunk onto the outer diameter of the conductive tubing or wire used to form the antenna to allow close packing of turns within the antenna coil. The insulating tubing is capable of standing off the RF voltage differences between different portions of the antenna, and between the antenna and the Faraday shield.
Public/Granted literature
- US20120080148A1 Compact RF Antenna for an Inductively Coupled Plasma Ion Source Public/Granted day:2012-04-05
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