Invention Grant
US08736504B1 Phase center coincident, dual-polarization BAVA radiating elements for UWB ESA apertures
有权
相位中心重合,用于UWB ESA孔径的双极化BAVA辐射元件
- Patent Title: Phase center coincident, dual-polarization BAVA radiating elements for UWB ESA apertures
- Patent Title (中): 相位中心重合,用于UWB ESA孔径的双极化BAVA辐射元件
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Application No.: US12893648Application Date: 2010-09-29
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Publication No.: US08736504B1Publication Date: 2014-05-27
- Inventor: James B. West , Modhwajih A. ElSallal
- Applicant: James B. West , Modhwajih A. ElSallal
- Applicant Address: US IA Cedar Rapids
- Assignee: Rockwell Collins, Inc.
- Current Assignee: Rockwell Collins, Inc.
- Current Assignee Address: US IA Cedar Rapids
- Agent Donna P. Suchy; Daniel M. Barbieri
- Main IPC: H01Q13/10
- IPC: H01Q13/10

Abstract:
The present disclosure is directed to a dual polarized antenna array including a first BAVA (a horizontal polarization input), a second BAVA (a vertical polarization input), and a cradle assembly. The substrates of the first and second BAVAs each include a notched portion. The cradle assembly includes a base plate having four channel modules connected thereto. Edge portions of the substrates of the first and second BAVAs are received by the cradle assembly via channels of the channel modules and apertures of the base plate. The substrates of the BAVAs are interleaved via their notched portions so that the substrate of the second BAVA is an orthogonal orientation relative to the substrate of the first BAVA.
Information query