Invention Grant
US08736688B2 Method and device for analyzing the optical quality of a transparent substrate
有权
用于分析透明基板的光学质量的方法和装置
- Patent Title: Method and device for analyzing the optical quality of a transparent substrate
- Patent Title (中): 用于分析透明基板的光学质量的方法和装置
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Application No.: US13637318Application Date: 2011-03-28
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Publication No.: US08736688B2Publication Date: 2014-05-27
- Inventor: Michel Pichon , Franc Davenne
- Applicant: Michel Pichon , Franc Davenne
- Applicant Address: FR Courbevoie
- Assignee: Saint-Gobain Glass France
- Current Assignee: Saint-Gobain Glass France
- Current Assignee Address: FR Courbevoie
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: FR1052477 20100401
- International Application: PCT/FR2011/050675 WO 20110328
- International Announcement: WO2011/121219 WO 20111006
- Main IPC: H04N5/225
- IPC: H04N5/225

Abstract:
A device for analyzing a transparent surface of a substrate including a reference pattern facing a surface of the substrate to be measured. The reference pattern is formed on a support of short and long extents. A camera is provided for taking at least one image of the reference pattern distorted by the measured substrate. A reference pattern illumination system and a processor for processing the image and digital analysis are connected to the camera. The support is of oblong shape and the reference pattern is a one-directional pattern that extends along the shortest extent of the support. The pattern is transversely periodic to the short extent, and the camera is a linear camera.
Public/Granted literature
- US20130010175A1 METHOD AND DEVICE FOR ANALYZING THE OPTICAL QUALITY OF A TRANSPARENT SUBSTRATE Public/Granted day:2013-01-10
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