Invention Grant
US08736808B2 Stage drive method and stage unit, exposure apparatus, and device manufacturing method
有权
舞台驱动方法和舞台单元，曝光装置和装置制造方法
- Patent Title: Stage drive method and stage unit, exposure apparatus, and device manufacturing method
- Patent Title (中): 舞台驱动方法和舞台单元，曝光装置和装置制造方法
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Application No.: US12923786Application Date: 2010-10-07
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Publication No.: US08736808B2Publication Date: 2014-05-27
- Inventor: Yuichi Shibazaki
- Applicant: Yuichi Shibazaki
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2004-025837 20040202; JP2004-300566 20041014
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52 ; G03F7/20
Abstract:
A lithographic projection apparatus includes a substrate table to hold a substrate, a projection system to project a patterned beam of radiation onto the substrate and a liquid confinement structure to confine a liquid in a space between the projection system and the substrate, the substrate, the substrate table, or both, to form a part of a boundary of the space. In addition, a closing plate forms a part of a boundary of the space in place of the substrate, the substrate table, or both, when moved without substantially disturbing the liquid, the liquid confinement structure, or both.
Public/Granted literature
- US20110051105A1 Stage drive method and stage unit, exposure apparatus, and device manufacturing method Public/Granted day:2011-03-03
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