Invention Grant
- Patent Title: Nitride semiconductor laser device and wafer
- Patent Title (中): 氮化物半导体激光器件和晶圆
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Application No.: US13629998Application Date: 2012-09-28
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Publication No.: US08737443B2Publication Date: 2014-05-27
- Inventor: Kentaro Tani , Yoshihiko Tani , Toshiyuki Kawakami
- Applicant: Sharp Kabushiki Kaisha
- Applicant Address: JP Osaka
- Assignee: Sharp Kabushiki Kaisha
- Current Assignee: Sharp Kabushiki Kaisha
- Current Assignee Address: JP Osaka
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JP2009-153470 20090629
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
A nitride semiconductor laser device is provided herein that is reduced in capacitance to have a better response. The nitride semiconductor laser device includes: an active layer; an upper cladding layer which is stacked above the active layer; a low dielectric constant insulating film which is stacked above the upper cladding layer; and a pad electrode which is stacked above the low dielectric constant insulating film.
Public/Granted literature
- US20130022071A1 NITRIDE SEMICONDUCTOR LASER DEVICE AND WAFER Public/Granted day:2013-01-24
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