Invention Grant
- Patent Title: Polishing composition containing polyether amine
- Patent Title (中): 含聚醚胺的抛光组合物
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Application No.: US12462067Application Date: 2009-07-29
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Publication No.: US08741009B2Publication Date: 2014-06-03
- Inventor: Jeffrey M. Dysard , Paul M. Feeney , Sriram P. Anjur , Timothy P. Johns , Yun-Biao Xin , Li Wang
- Applicant: Jeffrey M. Dysard , Paul M. Feeney , Sriram P. Anjur , Timothy P. Johns , Yun-Biao Xin , Li Wang
- Applicant Address: US IL Aurora
- Assignee: Cabot Microelectronics Corporation
- Current Assignee: Cabot Microelectronics Corporation
- Current Assignee Address: US IL Aurora
- Agent Thomas E Omholt; Steven D Weseman
- Main IPC: C09K3/14
- IPC: C09K3/14 ; B24D3/02 ; C09C1/68 ; C09G1/02
Abstract:
The inventive chemical-mechanical polishing system comprises a polishing component, a liquid carrier, and a polyether amine. The inventive method comprises chemically-mechanically polishing a substrate with the aforementioned polishing system.
Public/Granted literature
- US20090289033A1 Polishing composition containing polyether amine Public/Granted day:2009-11-26
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