Invention Grant
- Patent Title: Single-crystal manufacturing apparatus and method for manufacturing single crystal
- Patent Title (中): 单晶制造装置及单晶制造方法
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Application No.: US12866402Application Date: 2009-02-17
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Publication No.: US08741059B2Publication Date: 2014-06-03
- Inventor: Takao Abe
- Applicant: Takao Abe
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Handotai Co., Ltd.
- Current Assignee: Shin-Etsu Handotai Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2008-075611 20080324
- International Application: PCT/JP2009/000626 WO 20090217
- International Announcement: WO2009/118993 WO 20091001
- Main IPC: C30B15/02
- IPC: C30B15/02

Abstract:
According to the present invention, there is provided a single-crystal manufacturing apparatus based on Czochralski method, comprising at least: a main chamber configured to accommodate hot zone components including a crucible; and a pull chamber configured to accommodate and take out a single crystal pulled from a raw material melt contained in the crucible, wherein the apparatus further comprises: a cooling pipe which is arranged above the crucible and in which a cooling medium is circulated; and a moving mechanism that moves up and down the cooling pipe, and the hot zone components are cooled down by utilizing the moving mechanism to move down the cooling pipe toward the crucible after growth of the single crystal, and a method for manufacturing a single crystal is also provided. As a result, there can be provided the single crystal manufacturing apparatus and the method for manufacturing a single crystal that enable cooling the hot zone components in the main chamber in a short time after pulling a single crystal having a large diameter, e.g., approximately 200 mm or above.
Public/Granted literature
- US20100319610A1 SINGLE-CRYSTAL MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING SINGLE CRYSTAL Public/Granted day:2010-12-23
Information query
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