Invention Grant
- Patent Title: Apparatus and method for indirect surface cleaning
- Patent Title (中): 用于间接表面清洗的设备和方法
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Application No.: US14077028Application Date: 2013-11-11
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Publication No.: US08741067B2Publication Date: 2014-06-03
- Inventor: Jeffrey E. LeClaire , Kenneth G. Roessler , David Brinkley
- Applicant: Rave, LLC
- Applicant Address: US FL Delray Beach
- Assignee: Rave, LLC
- Current Assignee: Rave, LLC
- Current Assignee Address: US FL Delray Beach
- Agency: Baker & Hostetler LLP
- Main IPC: B08B7/00
- IPC: B08B7/00

Abstract:
Methods for cleaning a surface of a photomask and for increasing the useable lifetime of the photomask are disclosed. One method includes, a first wafer print processing using a photomask and a pellicle disposed across the photomask, and cleaning the photomask. The cleaning the photomask includes directing a laser beam through the pellicle toward the photomask, the laser beam having a wavelength that is substantially equal to a local maximum of an absorption spectrum of the photomask, heating the photomask with the laser beam, and transferring heat from the photomask to a contaminant disposed on the photomask, thereby thermally decomposing the contaminant.
Public/Granted literature
- US20140069457A1 Apparatus And Method For Indirect Surface Cleaning Public/Granted day:2014-03-13
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