Invention Grant
US08741070B2 Liquid processing method, liquid processing apparatus and recording medium
有权
液体处理方法,液体处理装置和记录介质
- Patent Title: Liquid processing method, liquid processing apparatus and recording medium
- Patent Title (中): 液体处理方法,液体处理装置和记录介质
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Application No.: US13328058Application Date: 2011-12-16
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Publication No.: US08741070B2Publication Date: 2014-06-03
- Inventor: Nobutaka Mizutani , Tsutae Omori , Takehiko Orii , Akira Fujita
- Applicant: Nobutaka Mizutani , Tsutae Omori , Takehiko Orii , Akira Fujita
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Abelman, Frayne & Schwab
- Priority: JP2010-285921 20101222
- Main IPC: B08B3/04
- IPC: B08B3/04

Abstract:
Disclosed are a liquid processing method, a liquid processing apparatus, and a recording medium that can prevent convex portions of a target substrate from collapsing when a rinsing liquid is dried. A base surface of a target substrate is hydrophilized and the surfaces of convex portions become water-repellent by surface-processing the target substrate which includes a main body, a plurality of convex portions protruding from the main body, and a base surface formed between the convex portions on the substrate main body. Next, a rinsing liquid is supplied to the target substrate which has been subjected to the surface processing. Thereafter, the rinsing liquid is removed from the target substrate.
Public/Granted literature
- US20120160273A1 Liquid Processing Method, Liquid Processing Apparatus and Recording Medium Public/Granted day:2012-06-28
Information query
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