Invention Grant
- Patent Title: Sputtering devices and methods
- Patent Title (中): 溅射装置和方法
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Application No.: US12370106Application Date: 2009-02-12
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Publication No.: US08741115B2Publication Date: 2014-06-03
- Inventor: Gennady Yumshtyk , Dmitri Ivanov
- Applicant: Gennady Yumshtyk , Dmitri Ivanov
- Applicant Address: US FL Hollywood
- Assignee: BH5773 Ltd
- Current Assignee: BH5773 Ltd
- Current Assignee Address: US FL Hollywood
- Agency: Lathrop & Gage LLP
- Main IPC: C23C14/34
- IPC: C23C14/34

Abstract:
The invention provides devices and methods for depositing uniform coatings using cylindrical magnetron sputtering. The devices and methods of the invention are useful in depositing coatings on non-cylindrical workpiece surfaces. An assembly of electromagnets located within the bore of a hollow cylindrical emitter is used to form a magnetic field exterior to and near the exterior surface of the emitter. The magnet assembly configuration is selected to provide a magnetic field configuration compatible with the workpiece surface contour. The electromagnet assembly may be a plurality of magnet units, each unit having at least one electromagnet. The magnetic field strength from each magnet unit is separately and electrically adjustable. Each electromagnet in the assembly has a coil of electrically conducting material surrounding a specially shaped core of magnetic material.
Public/Granted literature
- US20090145743A1 SPUTTERING DEVICES AND METHODS Public/Granted day:2009-06-11
Information query
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