Invention Grant
- Patent Title: Process for producing water-resistant polarizing film
- Patent Title (中): 防水偏光膜的制造方法
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Application No.: US13922645Application Date: 2013-06-20
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Publication No.: US08741190B2Publication Date: 2014-06-03
- Inventor: Junzo Miyazaki , Shoichi Matsuda , Kyoko Nishiguchi
- Applicant: Nitto Denko Corporation
- Applicant Address: JP Ibaraki-shi
- Assignee: Nitto Denko Corporation
- Current Assignee: Nitto Denko Corporation
- Current Assignee Address: JP Ibaraki-shi
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2008-031346 20080213; JP2008-112600 20080423
- Main IPC: B29D7/01
- IPC: B29D7/01 ; F21V9/14 ; G02B5/30 ; G02C7/12 ; G02B5/22 ; G02B5/23

Abstract:
To obtain a water-resistant polarizing film free from deterioration in dichroic ratio caused by water-resistant treatment, it is critical that adjacent sulfonic acid groups or sulfonate groups in the organic dyes to be used for the polarizing film are spaced at moderate intervals. In a process for producing a water-resistant polarizing film of the present invention, the polarizing film before water-resistant treatment includes an organic dye which comprises an azo compound 20 represented by the following general formula (2)
Public/Granted literature
- US20130277871A1 PROCESS FOR PRODUCING WATER-RESISTANT POLARIZING FILM Public/Granted day:2013-10-24
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