Invention Grant
- Patent Title: Method for making a wafer level aluminum nitride substrate
- Patent Title (中): 制造晶圆级氮化铝衬底的方法
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Application No.: US13237100Application Date: 2011-09-20
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Publication No.: US08741211B2Publication Date: 2014-06-03
- Inventor: Yang-Kuao Kuo , Ching-Hui ChiangLin , Te-Po Liu
- Applicant: Yang-Kuao Kuo , Ching-Hui ChiangLin , Te-Po Liu
- Applicant Address: TW Taoyuan County
- Assignee: Chung-Shan Institute of Science and Technology, Armaments, Bureau, Ministry of National Defense
- Current Assignee: Chung-Shan Institute of Science and Technology, Armaments, Bureau, Ministry of National Defense
- Current Assignee Address: TW Taoyuan County
- Agency: Jackson IPG PLLC
- Priority: TW100127710A 20110804
- Main IPC: C04B35/581
- IPC: C04B35/581

Abstract:
Disclosed is a method for making a pure aluminum nitride substrate. At first, aluminum nitride is mixed with a water-resistant material and an adhesive material. The mixture is made into grains in a granulation process. The grains are molded into a nugget in a steel mode by hydraulic pressure. The nugget is subjected to a cold isostatic pressing process. At a low temperature, the water-resistant material and the adhesive material are removed from the nugget. Then, the nugget, boron nitride and nitrogen are introduced into and sintered in an oven, thus providing a pure aluminum nitride substrate. The purity and quality of the aluminum nitride substrate are high. The aluminum nitride substrate can be used in a light-emitting diode. The method is simple, the yield is high, and the heat radiation of the aluminum nitride substrate is excellent.
Public/Granted literature
- US20130032975A1 Method for Making a Wafer Level Aluminum Nitride Substrate Public/Granted day:2013-02-07
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