Invention Grant
- Patent Title: Flow passage control mechanism for microchip
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Application No.: US14082356Application Date: 2013-11-18
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Publication No.: US08741231B2Publication Date: 2014-06-03
- Inventor: Minoru Asogawa , Hisashi Hagiwara , Tohru Hiramatsu
- Applicant: Minoru Asogawa , Hisashi Hagiwara , Tohru Hiramatsu
- Applicant Address: JP Tokyo
- Assignee: NEC Corporation
- Current Assignee: NEC Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2008-075395 20080324
- Main IPC: G01N15/06
- IPC: G01N15/06

Abstract:
A channel control mechanism for a microchip has a laminated structure formed of members including elastic members, and includes: a sample reservoir for packing a sample therein; a reaction reservoir in which mixture and reaction of the sample are performed; and a channel formed in a middle layer of the laminated structure, for bringing the sample reservoir and the reaction reservoir into communication with each other. The channel control mechanism performs the reaction and analysis in such a manner that the sample is delivered into the reaction reservoir through the channel. A shutter channel (pressurizing channel) is provided in a layer different from a layer in which the channel is formed so that the pressurizing channel partially overlaps the channel. The channel is closed through applying a pressurized medium to the shutter channel (pressurizing channel), and the channel is opened through releasing a pressure of the pressurized medium.
Public/Granted literature
- US20140079605A1 FLOW PASSAGE CONTROL MECHANISM FOR MICROCHIP Public/Granted day:2014-03-20
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