Invention Grant
- Patent Title: Mask and repairing method therefor
- Patent Title (中): 面膜及修补方法
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Application No.: US13638081Application Date: 2012-07-16
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Publication No.: US08741506B2Publication Date: 2014-06-03
- Inventor: Jiaxing Ma
- Applicant: Jiaxing Ma
- Applicant Address: CN Guangdong
- Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Current Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Current Assignee Address: CN Guangdong
- Agent Kirton McConkie; Evan R. Witt
- Priority: CN201210199257 20120615
- International Application: PCT/CN2012/078669 WO 20120716
- International Announcement: WO2013/185401 WO 20131219
- Main IPC: G03F1/72
- IPC: G03F1/72

Abstract:
The present invention provides a mask and a repairing method therefor. A reference area is selected in a configuration pattern of a mask template, the reference area is corresponding to a to-be-shaded area of a mask; a repair area is formed on a drillable member according to the reference area; a hollow area is formed in the repair area of the drillable member, the hollow area is corresponding to the to-be-shaded area; the drillable member is attached to the mask, the hollow area is corresponding to the to-be-shaded area; and shading material is coated on the drillable member, so as to form a shaded layer on the to-be-shaded layer.
Public/Granted literature
- US20130337371A1 MASK AND REPAIRING METHOD THEREFOR Public/Granted day:2013-12-19
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