Invention Grant
US08741537B2 Positive resist composition and pattern-forming method using the same
有权
正型抗蚀剂组合物和使用其的图案形成方法
- Patent Title: Positive resist composition and pattern-forming method using the same
- Patent Title (中): 正型抗蚀剂组合物和使用其的图案形成方法
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Application No.: US11366420Application Date: 2006-03-03
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Publication No.: US08741537B2Publication Date: 2014-06-03
- Inventor: Hiromi Kanda
- Applicant: Hiromi Kanda
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JPP.2005-060391 20050304
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004 ; G03F7/20
Abstract:
A positive resist composition, which comprises a resin having a structure showing a basicity and capable of increasing the solubility in an alkali developer by the action of an acid, and a pattern-forming method using the same.
Public/Granted literature
- US20060199100A1 Positive resist composition and pattern-forming method using the same Public/Granted day:2006-09-07
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