Invention Grant
US08741542B2 Actinic ray-sensitive or radiation-sensitive resin composition, film formed using the composition and pattern forming method using the same
有权
光化射线敏感或辐射敏感性树脂组合物，使用其组合物和图案形成方法形成的膜
- Patent Title: Actinic ray-sensitive or radiation-sensitive resin composition, film formed using the composition and pattern forming method using the same
- Patent Title (中): 光化射线敏感或辐射敏感性树脂组合物，使用其组合物和图案形成方法形成的膜
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Application No.: US13512633Application Date: 2010-11-30
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Publication No.: US08741542B2Publication Date: 2014-06-03
- Inventor: Tomotaka Tsuchimura , Takayuki Ito , Toru Fujimori , Kana Fujii
- Applicant: Tomotaka Tsuchimura , Takayuki Ito , Toru Fujimori , Kana Fujii
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2009-272353 20091130
- International Application: PCT/JP2010/071782 WO 20101130
- International Announcement: WO2011/065594 WO 20110603
- Main IPC: G03F7/027
- IPC: G03F7/027 ; G03F7/039 ; G03F7/30
Abstract:
Provided is an actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a specific compound represented by a general formula, (B) a resin which is alkali-insoluble or sparingly alkali-soluble and becomes easily alkali-soluble in the presence of an acid, and (C) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; a film formed using the composition; and a pattern forming method using the same.
Public/Granted literature
Information query
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