Invention Grant
US08741544B2 Salt, photoresist composition and method for producing photoresist pattern
有权
盐，光致抗蚀剂组合物和制造光致抗蚀剂图案的方法
- Patent Title: Salt, photoresist composition and method for producing photoresist pattern
- Patent Title (中): 盐，光致抗蚀剂组合物和制造光致抗蚀剂图案的方法
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Application No.: US13589852Application Date: 2012-08-20
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Publication No.: US08741544B2Publication Date: 2014-06-03
- Inventor: Isao Yoshida , Yuichi Mukai , Koji Ichikawa
- Applicant: Isao Yoshida , Yuichi Mukai , Koji Ichikawa
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Chemical Company, Limited
- Current Assignee: Sumitomo Chemical Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2011-180291 20110822; JP2012-014868 20120127
- Main IPC: G03F7/00
- IPC: G03F7/00 ; C07C317/06 ; C07C309/19 ; C07C309/07
Abstract:
A photoresist composition containing a resin that is hardly soluble or insoluble, but which is soluble in an aqueous alkali solution by action of an acid, and a salt represented by formula (I): wherein Q1, Q2, L1, W1, W2, R1, R2, t1 and t2 are defined in the specification, and Z+ represents an organic cation.
Public/Granted literature
- US20130052588A1 SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN Public/Granted day:2013-02-28
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