Invention Grant
US08741553B2 Aromatic hydrocarbon resin, underlayer film forming composition for lithography, and method for forming multilayer resist pattern
有权
芳族烃树脂，用于光刻的下层膜形成组合物，以及形成多层抗蚀剂图案的方法
- Patent Title: Aromatic hydrocarbon resin, underlayer film forming composition for lithography, and method for forming multilayer resist pattern
- Patent Title (中): 芳族烃树脂，用于光刻的下层膜形成组合物，以及形成多层抗蚀剂图案的方法
-
Application No.: US13976611Application Date: 2011-12-14
-
Publication No.: US08741553B2Publication Date: 2014-06-03
- Inventor: Go Higashihara , Naoya Uchiyama , Masatoshi Echigo
- Applicant: Go Higashihara , Naoya Uchiyama , Masatoshi Echigo
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee Address: JP Tokyo
- Agency: Fitch, Even, Tabin & Flannery, LLP
- Priority: JP2010-293931 20101228
- International Application: PCT/JP2011/006979 WO 20111214
- International Announcement: WO2012/090408 WO 20120705
- Main IPC: C08G14/04
- IPC: C08G14/04 ; C08G8/10 ; G03F7/11 ; G03F7/40 ; H01L21/027
Abstract:
Provided is an aromatic hydrocarbon resin with a high carbon concentration and a low oxygen concentration that can be used as a coating agent or a resist resin for semiconductors, as well as a composition for forming an underlayer film for photolithography with excellent etching resistance as an underlayer film for a multilayer resist process, an underlayer film formed from the composition, and a method for forming a pattern using the underlayer film. An aromatic hydrocarbon, an aromatic aldehyde, and a phenol derivative are reacted in the presence of an acidic catalyst to yield an aromatic hydrocarbon resin with a high carbon concentration of 90 to 99.9 mass % and a solubility in propylene glycol monomethyl ether acetate of 10 mass % or more.
Public/Granted literature
Information query
