Invention Grant
US08741671B2 Method for manufacturing light emitting device having an active layer formed over a Ga-face
有权
一种制造具有形成在Ga面上的有源层的发光器件的方法
- Patent Title: Method for manufacturing light emitting device having an active layer formed over a Ga-face
- Patent Title (中): 一种制造具有形成在Ga面上的有源层的发光器件的方法
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Application No.: US13280600Application Date: 2011-10-25
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Publication No.: US08741671B2Publication Date: 2014-06-03
- Inventor: JiHyung Moon , HwanHee Jeong , KwangKi Choi , JuneO Song , SangYoul Lee
- Applicant: JiHyung Moon , HwanHee Jeong , KwangKi Choi , JuneO Song , SangYoul Lee
- Applicant Address: KR Seoul
- Assignee: LG Innotek Co., Ltd.
- Current Assignee: LG Innotek Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Ked & Associates, LLP
- Priority: KR10-2010-0107135 20101029
- Main IPC: H01L33/58
- IPC: H01L33/58 ; H01L33/26

Abstract:
A method for manufacturing a light emitting device is disclosed. The disclosed method includes forming a first-conductivity-type semiconductor layer over a first substrate such that a first surface of the first-conductivity-type semiconductor layer is adjacent to the first substrate, disposing a second substrate on a second surface of the first-conductivity-type semiconductor layer opposite the first surface, separating the first substrate, disposing a third substrate on the first surface, separating the second substrate, and forming an active layer and a second-conductivity-type semiconductor layer over the second surface. In accordance with the method, it is possible to use a relatively inexpensive substrate. As a semiconductor layer is formed over a Ga-face of a gallium nitride semiconductor layer, an increase in light emission efficiency is achieved.
Public/Granted literature
- US20120107979A1 METHOD FOR MANUFACTURING LIGHT EMITTING DEVICE Public/Granted day:2012-05-03
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