Invention Grant
US08741679B2 Surface treatment method by using the NH3 plasma treatment to modify the sensing thin-film
有权
表面处理方法采用NH3等离子体处理改性传感薄膜
- Patent Title: Surface treatment method by using the NH3 plasma treatment to modify the sensing thin-film
- Patent Title (中): 表面处理方法采用NH3等离子体处理改性传感薄膜
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Application No.: US13466291Application Date: 2012-05-08
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Publication No.: US08741679B2Publication Date: 2014-06-03
- Inventor: Chao-Sung Lai , Jau-Song Yu , Yu-Sun Chang , Po-Lung Yang , Tseng-Fu Lu , Yi-Ting Lin , Wen-Yu Chuang , Ting-Chun Yu , I-Shun Wang , Jyh-Ping Chen , Chou Chien
- Applicant: Chao-Sung Lai , Jau-Song Yu , Yu-Sun Chang , Po-Lung Yang , Tseng-Fu Lu , Yi-Ting Lin , Wen-Yu Chuang , Ting-Chun Yu , I-Shun Wang , Jyh-Ping Chen , Chou Chien
- Applicant Address: TW Tao-Yuan
- Assignee: Chang Gung University
- Current Assignee: Chang Gung University
- Current Assignee Address: TW Tao-Yuan
- Agency: Bacon & Thomas, PLLC
- Priority: TW100121252A 20110617
- Main IPC: H01L21/336
- IPC: H01L21/336 ; H01L21/31 ; G01N27/414 ; C12Q1/00 ; A61B5/00
Abstract:
The NH3 plasma treatment by remote plasma is firstly proposed to replace the covalent bonding process during surface modification procedure that for amine bond generation.
Public/Granted literature
- US20120322167A1 SURFACE TREATMENT METHOD BY USING THE NH3 PLASMA TREATMENT TO MODIFY THE SENSING THIN-FILM Public/Granted day:2012-12-20
Information query
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