Invention Grant
- Patent Title: Method for processing a glass substrate
- Patent Title (中): 玻璃基板的加工方法
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Application No.: US13171749Application Date: 2011-06-29
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Publication No.: US08741747B2Publication Date: 2014-06-03
- Inventor: Xuanjie Liu , Herb Huang , Guoan Liu
- Applicant: Xuanjie Liu , Herb Huang , Guoan Liu
- Applicant Address: CN Shanghai
- Assignee: Semiconductor Manufacturing International (Shanghai) Corporation
- Current Assignee: Semiconductor Manufacturing International (Shanghai) Corporation
- Current Assignee Address: CN Shanghai
- Agency: Anova Law Group, PLLC
- Priority: CN201010620462 20101231
- Main IPC: H01L21/20
- IPC: H01L21/20 ; C03C17/22

Abstract:
A method for processing a glass substrate is disclosed. A glass substrate including a first surface, a second surface, and a side surface between the first surface and the second surface is provided. An opaque conductive layer is formed on the second surface and a part of the side surface close to the second surface. Thereafter, a semiconductor process is performed on the first surface. Thereafter, the opaque conductive layer on the second surface and the part of the side surface close to the second surface is removed. The problem of transporting a transparent glass substrate by some semiconductor tools is solved without increasing tool cost by enabling the sensing and transportation of glass substrates with optical sensor and/or electrical chuck. The fabrication of devices with a glass substrate is also achieved.
Public/Granted literature
- US20120171835A1 METHOD FOR PROCESSING A GLASS SUBSTRATE Public/Granted day:2012-07-05
Information query
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