Invention Grant
- Patent Title: Cross-hair cell wordline formation
- Patent Title (中): 跨毛细胞字线形成
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Application No.: US13745441Application Date: 2013-01-18
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Publication No.: US08741758B2Publication Date: 2014-06-03
- Inventor: Werner Juengling
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technologies, Inc.
- Current Assignee: Micron Technologies, Inc.
- Current Assignee Address: US ID Boise
- Agency: Fletcher Yoder, P.C.
- Main IPC: H01L21/3205
- IPC: H01L21/3205 ; H01L21/4763

Abstract:
Methods and devices depicting fabrication of non-planar access devices having fins and narrow trenches, among which is a method that includes wet etching a conductor to form a recessed region and subsequently etching the conductor to form gates on the fins. The wet etching may include formation of recesses which are may be backfilled with a fill material to form spacers on the conductor. Portions of a plug may be removed during the wet etch to form overhanging spacers to provide further protection of the conductor during the dry etch.
Public/Granted literature
- US20130146951A1 CROSS-HAIR CELL WORDLINE FORMATION Public/Granted day:2013-06-13
Information query
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