Invention Grant
US08742005B2 Acrylate-based compounds and photosensitive composition comprising the same
有权
基于丙烯酸酯的化合物和包含它们的光敏组合物
- Patent Title: Acrylate-based compounds and photosensitive composition comprising the same
- Patent Title (中): 基于丙烯酸酯的化合物和包含它们的光敏组合物
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Application No.: US13300055Application Date: 2011-11-18
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Publication No.: US08742005B2Publication Date: 2014-06-03
- Inventor: Keon Woo Lee , Sang Kyu Kwak , Changsoon Lee , Hyehyeon Kim
- Applicant: Keon Woo Lee , Sang Kyu Kwak , Changsoon Lee , Hyehyeon Kim
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: KR10-2010-0115556 20101119
- Main IPC: G03F7/32
- IPC: G03F7/32 ; C07C69/94 ; C07C69/602 ; G03F7/027 ; G03F7/033 ; G03F7/032 ; C07C69/92
Abstract:
The present invention relates to an acrylate-based compound that includes an organic acid having two or more acrylate groups and one or more phenolic acid structures in one molecule, and a photosensitive composition including the same. It is possible to shorten a developing time in a photolithography process without damaging photosensitivity by using the photosensitive composition according to the present invention.
Public/Granted literature
- US20120156619A1 ACRYLATE-BASED COMPOUNDS AND PHOTOSENSITIVE COMPOSITION COMPRISING THE SAME Public/Granted day:2012-06-21
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