Invention Grant
US08742009B2 Temporary adhesive composition, and method of producing thin wafer
有权
临时粘合剂组合物和薄晶片的制造方法
- Patent Title: Temporary adhesive composition, and method of producing thin wafer
- Patent Title (中): 临时粘合剂组合物和薄晶片的制造方法
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Application No.: US13109193Application Date: 2011-05-17
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Publication No.: US08742009B2Publication Date: 2014-06-03
- Inventor: Masahiro Furuya
- Applicant: Masahiro Furuya
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2010-128464 20100604
- Main IPC: C08L83/08
- IPC: C08L83/08

Abstract:
A temporary adhesive for which temporary adhesion is simple and subsequent detachment is also simple, meaning productivity can be improved. Also, a method of producing a thin wafer that uses the temporary adhesive. The temporary adhesive composition comprises: (A) an organopolysiloxane comprising: (I) 40 to 99 mol % of siloxane units represented by R1SiO3/2 (T units), (II) 0 to 49 mol % of siloxane units represented by R2R3SiO2/2 units (D units) and (III) 1 to 25 mol % of siloxane units represented by R4R5R6SiO1/2 units (M units) (wherein each of R1 to R6 represents an unsubstituted or substituted monovalent hydrocarbon group of 1 to 10 carbon atoms), and having a weight-average molecular weight exceeding 2,000, and (B) an organic solvent having a boiling point of not more than 220° C.
Public/Granted literature
- US20110297300A1 TEMPORARY ADHESIVE COMPOSITION, AND METHOD OF PRODUCING THIN WAFER Public/Granted day:2011-12-08
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