Invention Grant
US08742361B2 Focused charged particle column for operation at different beam energies at a target
有权
用于在目标处的不同射束能量下操作的聚焦带电粒子柱
- Patent Title: Focused charged particle column for operation at different beam energies at a target
- Patent Title (中): 用于在目标处的不同射束能量下操作的聚焦带电粒子柱
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Application No.: US13490650Application Date: 2012-06-07
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Publication No.: US08742361B2Publication Date: 2014-06-03
- Inventor: Mostafa Maazouz , Jonathan H. Orloff
- Applicant: Mostafa Maazouz , Jonathan H. Orloff
- Applicant Address: US OR Hillsboro
- Assignee: FEI Company
- Current Assignee: FEI Company
- Current Assignee Address: US OR Hillsboro
- Agency: Scheinberg & Assoc., PC
- Agent Michael O. Scheinberg
- Main IPC: H01J37/12
- IPC: H01J37/12 ; H01J37/153 ; H01J37/21 ; H01J37/04

Abstract:
A charged particle column having improved performance at multiple beam energies. The column employs a four-element objective lens to enable improved beam focusing performance at both high and low beam energies at a target, with differing focus voltage configurations for different beam energies. By changing the voltages applied to the four electrodes of the objective lens, different focusing conditions may be rapidly configured, enabling rapid toggling between optimized imaging and optimized processing of a target.
Public/Granted literature
- US20130327952A1 Focused Charged Particle Column for Operation at Different Beam Energies at a Target Public/Granted day:2013-12-12
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