Invention Grant
- Patent Title: Non-volatile semiconductor memory
- Patent Title (中): 非易失性半导体存储器
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Application No.: US13788596Application Date: 2013-03-07
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Publication No.: US08742391B2Publication Date: 2014-06-03
- Inventor: Ichiro Mizushima , Hirotaka Ogihara , Kensuke Takahashi , Masanobu Baba
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Patterson + Sheridan LLP.
- Priority: JPP2012-068438 20120323
- Main IPC: H01L47/00
- IPC: H01L47/00

Abstract:
A non-volatile semiconductor memory includes a word line extending in a first direction, a first electrode connected to the word line electrically, an ion diffusion layer with connected to the first electrode electrically, a second electrode connected to the ion diffusion layer electrically and formed of a metal to be diffused into the ion diffusion layer when a positive voltage is supplied thereto, and a bit line extending in a second direction perpendicular to the first direction, the bit line connected to the second electrode electrically. The ion diffusion layer has a first region disposed on the first electrode and a second region disposed between the first region and the second electrode, and the metal is more difficult to diffuse into the second region than into the first region.
Public/Granted literature
- US20130270506A1 NON-VOLATILE SEMICONDUCTOR MEMORY Public/Granted day:2013-10-17
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