Invention Grant
- Patent Title: Field effect transistor with gated and non-gated trenches
- Patent Title (中): 具有门控和非门控沟槽的场效应晶体管
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Application No.: US14068781Application Date: 2013-10-31
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Publication No.: US08742401B2Publication Date: 2014-06-03
- Inventor: Hamza Yilmaz , Daniel Calafut , Steven Sapp , Nathan Kraft , Ashok Challa
- Applicant: Fairchild Semiconductor Corporation
- Applicant Address: US ME South Portland
- Assignee: Fairchild Semiconductor Corporation
- Current Assignee: Fairchild Semiconductor Corporation
- Current Assignee Address: US ME South Portland
- Main IPC: H01L29/76
- IPC: H01L29/76

Abstract:
A field effect transistor includes a plurality of trenches extending into a semiconductor region of a first conductivity type. The plurality of trenches includes a plurality of gated trenches and a plurality of non-gated trenches. A body region of a second conductivity extends in the semiconductor region between adjacent trenches. A dielectric material fills a bottom portion of each of the gated and non-gated trenches. A gate electrode is disposed in each gated trench. A conductive material of the second conductivity type is disposed in each non-gated trench such that the conductive material and contacts corresponding body regions along sidewalls of the non-gated trench.
Public/Granted literature
- US20140054691A1 FIELD EFFECT TRANSISTOR WITH GATED AND NON-GATED TRENCHES Public/Granted day:2014-02-27
Information query
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