Invention Grant
US08742429B2 Semiconductor light emitting device and fabrication method thereof 有权
半导体发光器件及其制造方法

  • Patent Title: Semiconductor light emitting device and fabrication method thereof
  • Patent Title (中): 半导体发光器件及其制造方法
  • Application No.: US11995447
    Application Date: 2006-07-25
  • Publication No.: US08742429B2
    Publication Date: 2014-06-03
  • Inventor: Jin Sik Choi
  • Applicant: Jin Sik Choi
  • Applicant Address: KR Seoul
  • Assignee: LG Innotek Co., Ltd.
  • Current Assignee: LG Innotek Co., Ltd.
  • Current Assignee Address: KR Seoul
  • Agency: Birch, Stewart, Kolasch & Birch, LLP
  • Priority: KR10-2005-0067181 20050725
  • International Application: PCT/KR2006/002916 WO 20060725
  • International Announcement: WO2007/013757 WO 20070201
  • Main IPC: H01L33/00
  • IPC: H01L33/00
Semiconductor light emitting device and fabrication method thereof
Abstract:
A semiconductor light emitting device includes a first semiconductor layer having a bottom surface with uneven patterns, an active layer formed on the first semiconductor layer, a second semiconductor layer formed on the active layer, a second electrode formed on the second semiconductor layer, and a first electrode formed under the first semiconductor layer.
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