Invention Grant
- Patent Title: Semiconductor light emitting device and fabrication method thereof
- Patent Title (中): 半导体发光器件及其制造方法
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Application No.: US11995447Application Date: 2006-07-25
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Publication No.: US08742429B2Publication Date: 2014-06-03
- Inventor: Jin Sik Choi
- Applicant: Jin Sik Choi
- Applicant Address: KR Seoul
- Assignee: LG Innotek Co., Ltd.
- Current Assignee: LG Innotek Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: KR10-2005-0067181 20050725
- International Application: PCT/KR2006/002916 WO 20060725
- International Announcement: WO2007/013757 WO 20070201
- Main IPC: H01L33/00
- IPC: H01L33/00

Abstract:
A semiconductor light emitting device includes a first semiconductor layer having a bottom surface with uneven patterns, an active layer formed on the first semiconductor layer, a second semiconductor layer formed on the active layer, a second electrode formed on the second semiconductor layer, and a first electrode formed under the first semiconductor layer.
Public/Granted literature
- US20080217638A1 Semiconductor Light Emitting Device and Fabrication Method Thereof Public/Granted day:2008-09-11
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