Invention Grant
- Patent Title: Nitride semiconductor light-emitting element and method for producing same
- Patent Title (中): 氮化物半导体发光元件及其制造方法
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Application No.: US13579174Application Date: 2011-02-17
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Publication No.: US08742440B2Publication Date: 2014-06-03
- Inventor: Mayuko Fudeta , Eiji Yamada
- Applicant: Mayuko Fudeta , Eiji Yamada
- Applicant Address: JP Osaka-shi
- Assignee: Sharp Kabushiki Kaisha
- Current Assignee: Sharp Kabushiki Kaisha
- Current Assignee Address: JP Osaka-shi
- Agency: Morrison & Foerster LLP
- Priority: JP2010-034919 20100219
- International Application: PCT/JP2011/053358 WO 20110217
- International Announcement: WO2011/102411 WO 20110825
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L33/12 ; H01L33/20

Abstract:
Disclosed is a nitride semiconductor light-emitting element comprising a p-type nitride semiconductor layer 1, a p-type nitride semiconductor layer 2, and a p-type nitride semiconductor layer 3 placed in order above a nitride semiconductor active layer, wherein the p-type nitride semiconductor layer 1 and p-type nitride semiconductor layer 2 each contain Al, the average Al composition of the p-type nitride semiconductor layer 1 is equivalent to the average Al composition of the p-type nitride semiconductor layer 2, the p-type nitride semiconductor layer 3 has a smaller band gap than the p-type nitride semiconductor layer 2, the p-type impurity concentration of the p-type nitride semiconductor layer 2 and the p-type impurity concentration of the p-type nitride semiconductor layer 3 are both lower than the p-type impurity concentration of the p-type nitride semiconductor layer 1, and a method for producing same.
Public/Granted literature
- US20120319080A1 NITRIDE SEMICONDUCTOR LIGHT-EMITTING ELEMENT AND METHOD FOR PRODUCING SAME Public/Granted day:2012-12-20
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