Invention Grant
- Patent Title: Power semiconductor device having an active region and an electric field reduction region
- Patent Title (中): 功率半导体器件具有有源区和电场减少区
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Application No.: US11937725Application Date: 2007-11-09
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Publication No.: US08742474B2Publication Date: 2014-06-03
- Inventor: Yoshiaki Hisamoto , Atsushi Narazaki , Hitoshi Uemura
- Applicant: Yoshiaki Hisamoto , Atsushi Narazaki , Hitoshi Uemura
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-180931 20070710
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
A power semiconductor device of the present invention has an active region and an electric field reduction region and includes: an emitter region of a first conductivity type; a base region of a second conductivity type in contact with the emitter region; an electrical strength providing region of the first conductivity type in contact with the base region; a collector region of the second conductivity type in contact with the electrical strength providing region; and a collector electrode in contact with the collector region; wherein the collector region is disposed on both a active region and a electric field reduction region each containing a dopant of the second conductivity type, and the collector region disposed on the electric field reduction region includes a region having a lower density of carriers of the second conductivity type than the collector region disposed on the active region.
Public/Granted literature
- US20090014753A1 POWER SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR Public/Granted day:2009-01-15
Information query
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