Invention Grant
- Patent Title: Semiconductor devices having vertical channel transistors and methods for fabricating the same
- Patent Title (中): 具有垂直沟道晶体管的半导体器件及其制造方法
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Application No.: US13285263Application Date: 2011-10-31
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Publication No.: US08742493B2Publication Date: 2014-06-03
- Inventor: Dae-Ik Kim , Hyeong-Sun Hong , Yoo-Sang Hwang , Hyun-Woo Chung
- Applicant: Dae-Ik Kim , Hyeong-Sun Hong , Yoo-Sang Hwang , Hyun-Woo Chung
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Volentine & Whitt, PLLC
- Priority: KR10-2010-0112260 20101111
- Main IPC: H01L27/108
- IPC: H01L27/108

Abstract:
A semiconductor device has a plurality of vertical channels extending upright on a substrate, a plurality of bit lines extending among the vertical channels, a plurality of word lines which include a plurality of gates disposed adjacent first sides of the vertical channels, respectively, and a plurality of conductive elements disposed adjacent second sides of the vertical channels opposite the first sides. The conductive elements can provide a path to the substrate for charge carriers which have accumulated in the associated vertical channel to thereby mitigate a so-called floating effect.
Public/Granted literature
- US20120119286A1 SEMICONDUCTOR DEVICES HAVING VERTICAL CHANNEL TRANSISTORS AND METHODS FOR FABRICATING THE SAME Public/Granted day:2012-05-17
Information query
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