Invention Grant
- Patent Title: Protecting element having first and second high concentration impurity regions separated by insulating region
- Patent Title (中): 保护元件具有由绝缘区域隔开的第一和第二高浓度杂质区域
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Application No.: US13475375Application Date: 2012-05-18
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Publication No.: US08742506B2Publication Date: 2014-06-03
- Inventor: Tetsuro Asano , Mikito Sakakibara , Toshikazu Hirai
- Applicant: Tetsuro Asano , Mikito Sakakibara , Toshikazu Hirai
- Applicant Address: US AZ Phoenix
- Assignee: Semiconductor Components Industries, LLC
- Current Assignee: Semiconductor Components Industries, LLC
- Current Assignee Address: US AZ Phoenix
- Priority: JP2002-262844 20020909
- Main IPC: H01L29/861
- IPC: H01L29/861

Abstract:
With a microwave FET, an incorporated Schottky junction capacitance or PN junction capacitance is small and such a junction is weak against static electricity. However, with a microwave device, the method of connecting a protecting diode cannot be used since this method increases the parasitic capacitance and causes degradation of the high-frequency characteristics. In order to solve the above problems, a protecting element, having a first n+-type region-insulating region-second n+-type region arrangement is connected in parallel between two terminals of a protected element having a PN junction, Schottky junction, or capacitor. Since discharge can be performed between the first and second n+ regions that are adjacent each other, electrostatic energy that would reach the operating region of an FET can be attenuated without increasing the parasitic capacitance.
Public/Granted literature
- US20120228738A1 PROTECTING ELEMENT Public/Granted day:2012-09-13
Information query
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