Invention Grant
- Patent Title: Microelectronic devices and methods for manufacturing microelectronic devices
- Patent Title (中): 用于制造微电子器件的微电子器件和方法
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Application No.: US13675523Application Date: 2012-11-13
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Publication No.: US08742572B2Publication Date: 2014-06-03
- Inventor: Teck Kheng Lee
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Perkins Coie LLP
- Priority: SG200605271-6 20060804
- Main IPC: H01L23/34
- IPC: H01L23/34 ; H01L21/00 ; H05K13/00 ; H01L23/522 ; H01L23/00 ; H01L21/312 ; H01L23/48 ; H01L21/56 ; H01R43/16

Abstract:
Microelectronic devices and methods for manufacturing microelectronic devices are disclosed herein. An embodiment of one such method includes forming a plurality of through holes in a substrate with the through holes arranged in arrays, and attaching a plurality of singulated microelectronic dies to the substrate with an active side of the individual dies facing toward the substrate and with a plurality of terminals on the active side of the individual dies aligned with corresponding holes in the substrate. The singulated dies are attached to the substrate after forming the holes in the substrate.
Public/Granted literature
- US20130181356A1 MICROELECTRONIC DEVICES AND METHODS FOR MANUFACTURING MICROELECTRONIC DEVICES Public/Granted day:2013-07-18
Information query
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