Invention Grant
US08742666B2 Radio frequency (RF) power filters and plasma processing systems including RF power filters
有权
射频(RF)电源滤波器和等离子体处理系统,包括射频功率滤波器
- Patent Title: Radio frequency (RF) power filters and plasma processing systems including RF power filters
- Patent Title (中): 射频(RF)电源滤波器和等离子体处理系统,包括射频功率滤波器
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Application No.: US12960706Application Date: 2010-12-06
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Publication No.: US08742666B2Publication Date: 2014-06-03
- Inventor: Maolin Long , Ralph Lu , Fred Egley , Thomas Anderson , Seyed Jafar Jafarian-Tehrani , Michael Giarratano
- Applicant: Maolin Long , Ralph Lu , Fred Egley , Thomas Anderson , Seyed Jafar Jafarian-Tehrani , Michael Giarratano
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Martine Penilla Group, LLP
- Main IPC: H05H1/46
- IPC: H05H1/46 ; H03H1/00 ; H03H7/01

Abstract:
A filter for filtering radio frequency (RF) power transmitted from an electrostatic chuck (ESC) in a plasma processing system. The plasma processing system may include a heating element disposed at the ESC. The plasma processing system may further include a power supply. The filter may include a core member and a cable wound around and wound along the core member to form a set of inductors. The cable may include a plurality of wires, including a first wire and a second wire, a portion of the first wire and a portion of the second wire being twisted together, a first end of the first wire and a first end of the second wire being connected to the heating element, each of a second end of the first wire and a second end of the second wire being connected to a capacitor and being connected to the power supply.
Public/Granted literature
- US20120032756A1 RADIO FREQUENCY (RF) POWER FILTERS AND PLASMA PROCESSING SYSTEMS INCLUDING RF POWER FILTERS Public/Granted day:2012-02-09
Information query
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