Invention Grant
US08742666B2 Radio frequency (RF) power filters and plasma processing systems including RF power filters 有权
射频(RF)电源滤波器和等离子体处理系统,包括射频功率滤波器

Radio frequency (RF) power filters and plasma processing systems including RF power filters
Abstract:
A filter for filtering radio frequency (RF) power transmitted from an electrostatic chuck (ESC) in a plasma processing system. The plasma processing system may include a heating element disposed at the ESC. The plasma processing system may further include a power supply. The filter may include a core member and a cable wound around and wound along the core member to form a set of inductors. The cable may include a plurality of wires, including a first wire and a second wire, a portion of the first wire and a portion of the second wire being twisted together, a first end of the first wire and a first end of the second wire being connected to the heating element, each of a second end of the first wire and a second end of the second wire being connected to a capacitor and being connected to the power supply.
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