Invention Grant
- Patent Title: Mechanisms for resistivity measurement of bump structures
- Patent Title (中): 凸块结构电阻率测量机理
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Application No.: US13012916Application Date: 2011-01-25
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Publication No.: US08742776B2Publication Date: 2014-06-03
- Inventor: You-Hua Chou , Mill-Jer Wang , Pi-Huang Lee , Jeff Wang , Feynmann Chu
- Applicant: You-Hua Chou , Mill-Jer Wang , Pi-Huang Lee , Jeff Wang , Feynmann Chu
- Applicant Address: TW
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW
- Agency: Lowe Hauptman & Ham, LLP
- Main IPC: G01R27/08
- IPC: G01R27/08

Abstract:
The embodiments described above provide mechanisms for bump resistivity measurement. By using designated bumps on one or more corners of dies, the resistivity of bumps may be measured without damaging devices and without a customized probing card. In addition, bump resistivity may be collected across the entire wafer. The collected resistivity data may be used to monitor the stability and/or health of processes used to form bumps and their underlying layers.
Public/Granted literature
- US20120133379A1 MECHANISMS FOR RESISTIVITY MEASUREMENT OF BUMP STRUCTURES Public/Granted day:2012-05-31
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