Invention Grant
- Patent Title: Imprint lithography method and apparatus
- Patent Title (中): 压印光刻方法和装置
-
Application No.: US13098759Application Date: 2011-05-02
-
Publication No.: US08743361B2Publication Date: 2014-06-03
- Inventor: Johan Frederik Dijksman , Arie Jeffrey Den Boef , Sander Frederik Wuister , Martinus Bernardus Van Der Mark
- Applicant: Johan Frederik Dijksman , Arie Jeffrey Den Boef , Sander Frederik Wuister , Martinus Bernardus Van Der Mark
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G01B11/00
- IPC: G01B11/00 ; B41F1/34 ; B41F21/12 ; B41F21/14 ; B41L1/02 ; B41L3/02 ; B41L3/08

Abstract:
A method of aligning a substrate and an imprint template is disclosed. The method includes directing an alignment radiation beam towards an imprint template alignment mark and an adjacent substrate alignment mark, the imprint template alignment mark and the substrate alignment mark each including a grating which extends in a first direction and a grating which extends in a second direction, providing relative movement between the imprint template and the substrate in the first direction and in the second direction, using an intensity detector to detect the intensity of alignment radiation redirected in the zero-order direction by the imprint template alignment mark and the substrate alignment mark during the relative movement in the first direction and in the second direction, and determining an aligned position of the imprint template alignment mark and the substrate alignment mark based upon the detected intensity.
Public/Granted literature
- US20110266706A1 IMPRINT LITHOGRAPHY METHOD AND APPARATUS Public/Granted day:2011-11-03
Information query