Invention Grant
- Patent Title: Metrology of optics with high aberrations
- Patent Title (中): 具有高像差的光学计量学
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Application No.: US13225467Application Date: 2011-09-04
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Publication No.: US08743373B1Publication Date: 2014-06-03
- Inventor: Mikhail Gutin , Xu-Ming Wang
- Applicant: Mikhail Gutin , Xu-Ming Wang
- Applicant Address: US NY Troy
- Assignee: Applied Science Innovations, Inc.
- Current Assignee: Applied Science Innovations, Inc.
- Current Assignee Address: US NY Troy
- Agent Jay R. Yablon
- Main IPC: G01B11/02
- IPC: G01B11/02

Abstract:
An interferometry method and associated system and computerized media for testing samples under test including those with high aberrations, comprising: situating a sample under test between a tilt mirror and a reference mirror, the tilt mirror tiltable with at least one degree of freedom about at least one tilt mirror axis, and further translatable along an axial line defined by a direction of propagation of a test wavefront from a source thereof; propagating the test wavefront toward the tilt mirror; after the test wavefront has been reflected by the tilt mirror, further propagating the test wavefront toward a reference mirror; and deriving a substantially complete first-tilt-alignment wavefront metrology of the sample under test from a plurality of first-tilt-alignment interferograms taken with the tilt mirror held fixed at a first predetermined tilt mirror angle while discreetly varying a displacement between the sample under test and the reference mirror.
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