Invention Grant
- Patent Title: Surface-emission laser diode and fabrication process thereof
- Patent Title (中): 表面发射激光二极管及其制造工艺
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Application No.: US13764167Application Date: 2013-02-11
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Publication No.: US08743924B2Publication Date: 2014-06-03
- Inventor: Shunichi Sato , Akihiro Itoh , Naoto Jikutani
- Applicant: Shunichi Sato , Akihiro Itoh , Naoto Jikutani
- Applicant Address: JP Tokyo
- Assignee: Ricoh Company, Ltd.
- Current Assignee: Ricoh Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Cooper & Dunham LLP
- Priority: JP2004-173890 20040611; JP2004-359671 20041213; JP2005-088188 20050325; JP2005-101765 20050331
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
In a surface-emission laser diode, there is provided, between an active layer and a semiconductor layer that contains Al, Ga and As as major components, a semiconductor layer containing Al, In and P as major components such that the semiconductor layer containing Al, In and P as major components is provided adjacent to the semiconductor layer that contains Al, Ga and As as major components. Further, an interface between the semiconductor layer containing Al, Ga and As as major components and the semiconductor layer containing Al, In and P as major components is coincident to a location of a node of electric field strength distribution.
Public/Granted literature
- US20140064313A1 SURFACE-EMISSION LASER DIODE AND FABRICATION PROCESS THEREOF Public/Granted day:2014-03-06
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