Invention Grant
- Patent Title: Knowledge artifact analysis system and method
- Patent Title (中): 知识工件分析系统和方法
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Application No.: US12145908Application Date: 2008-06-25
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Publication No.: US08744991B2Publication Date: 2014-06-03
- Inventor: Ravi Agarwal , Barath Sundaram , Aparna Ekambaram
- Applicant: Ravi Agarwal , Barath Sundaram , Aparna Ekambaram
- Applicant Address: IN Bangalore
- Assignee: Infosys Technologies Limited
- Current Assignee: Infosys Technologies Limited
- Current Assignee Address: IN Bangalore
- Agency: LeClairRyan, a Professional Corporation
- Main IPC: G06N5/02
- IPC: G06N5/02 ; G06F17/00

Abstract:
A knowledge tracking and analysis system and method. The method may include: an artifact evaluator that receives various use parameters for each knowledge artifact, operates on the received use parameters, and generates respective parameter scores; and a knowledge index calculator that compiles parameter scores and generates a knowledge index indicative of use of the knowledge entities during the project. The system and method allow analysis and tracking of knowledge artifacts in future projects.
Public/Granted literature
- US20090271357A1 KNOWLEDGE ARTIFACT ANALYSIS SYSTEM AND METHOD Public/Granted day:2009-10-29
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