Invention Grant
- Patent Title: Method for slicing wafers from a workpiece
- Patent Title (中): 从工件切片晶圆的方法
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Application No.: US13415863Application Date: 2012-03-09
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Publication No.: US08746227B2Publication Date: 2014-06-10
- Inventor: Anton Huber , Wolfgang Gmach , Robert Kreuzeder , Peter Wiesner
- Applicant: Anton Huber , Wolfgang Gmach , Robert Kreuzeder , Peter Wiesner
- Applicant Address: DE Munich
- Assignee: Siltronic AG
- Current Assignee: Siltronic AG
- Current Assignee Address: DE Munich
- Agency: Leydig, Voit & Mayer, Ltd.
- Priority: DE102011005948 20110323
- Main IPC: B23D61/18
- IPC: B23D61/18

Abstract:
A method for slicing wafers from a workpiece includes providing wire guide rolls each having a grooved coating with a specific thickness and providing rings at opposing ends of a first of the coatings of a respective wire guide roll. The rings are fixed exclusively to the first coating. A sawing wire including wire sections disposed in a parallel fashion is tensioned between the wire guide rolls. The wire sections of the sawing wire are moved relative to the workpiece so as to perform a sawing operation. A change in length of the first coating, brought about by a temperature change, is measured by measuring distances between sensors and the rings. The wire guide rolls are cooled in a manner dependent on the measured distances.
Public/Granted literature
- US20120240914A1 METHOD FOR SLICING WAFERS FROM A WORKPIECE Public/Granted day:2012-09-27
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