Invention Grant
- Patent Title: Substrate processing apparatus, substrate processing method and computer-readable medium storing program
- Patent Title (中): 基板处理装置,基板处理方法和计算机可读介质存储程序
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Application No.: US12795071Application Date: 2010-06-07
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Publication No.: US08746259B2Publication Date: 2014-06-10
- Inventor: Hideaki Sato
- Applicant: Hideaki Sato
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Abelman, Frayne & Schwab
- Priority: JP2009-137892 20090609
- Main IPC: B08B3/00
- IPC: B08B3/00

Abstract:
Disclosed is a substrate processing apparatus, a substrate processing method and a computer-readable medium capable of recovering an extended amount of discharged solution from a processing unit thereby reducing the amount of deionized water for the processing and the cost. The substrate processing apparatus includes, inter alia, a first and second discharge solution lines each connected to a downstream side of a discharge unit, and the discharged solution from each of the first and second discharge solution lines is independently delivered to the processing solution supply unit as a recovered solution. Also, the substrate processing apparatus includes a converting unit that converts flow of the discharged solution from the discharge unit either to the first discharge solution line or to the second discharge solution line. The processing solution supply unit selectively delivers the recovered solution from the first and second discharge solution lines to the processing unit.
Public/Granted literature
- US20100307533A1 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND COMPUTER-READABLE MEDIUM STORING PROGRAM Public/Granted day:2010-12-09
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