Invention Grant
- Patent Title: Process for making self-patterning substrates and the product thereof
- Patent Title (中): 制造自图形化基材的方法及其制品
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Application No.: US12230055Application Date: 2008-08-22
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Publication No.: US08747599B2Publication Date: 2014-06-10
- Inventor: Chidella Krishna Sastry , Chidella Venkata Krishna Mohan Sharma , Srinivas Tangirala
- Applicant: Chidella Krishna Sastry , Chidella Venkata Krishna Mohan Sharma , Srinivas Tangirala
- Agent Manabu Kanesaka
- Priority: IN1299/CHE/2008 20080529
- Main IPC: B32B27/00
- IPC: B32B27/00
Abstract:
The present invention relates to a process for making self-patterning substrates comprising the steps of providing electrically conductive traces on a substrate; pre-coating the substrate with at least a layer of complementary reactant electrically resistant reactant formulations; altering the conductivity of complementary reactant formulation selectively upon application of external source of energy and a self-patterning substrate using the said process.
Public/Granted literature
- US20090297802A1 Process for making self-patterning substrates and the product thereof Public/Granted day:2009-12-03
Information query
