Invention Grant
US08747982B2 Production method for an SiC volume monocrystal with a homogeneous lattice plane course and a monocrystalline SiC substrate with a homogeneous lattice plane course
有权
具有均匀晶格平面过程的SiC体积单晶的制备方法和具有均匀晶格平面过程的单晶SiC衬底
- Patent Title: Production method for an SiC volume monocrystal with a homogeneous lattice plane course and a monocrystalline SiC substrate with a homogeneous lattice plane course
- Patent Title (中): 具有均匀晶格平面过程的SiC体积单晶的制备方法和具有均匀晶格平面过程的单晶SiC衬底
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Application No.: US13338694Application Date: 2011-12-28
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Publication No.: US08747982B2Publication Date: 2014-06-10
- Inventor: Thomas Straubinger , Michael Vogel , Andreas Wohlfart
- Applicant: Thomas Straubinger , Michael Vogel , Andreas Wohlfart
- Applicant Address: DE Nuremberg
- Assignee: SiCrystal Aktiengesellschaft
- Current Assignee: SiCrystal Aktiengesellschaft
- Current Assignee Address: DE Nuremberg
- Agent Laurence A. Greenberg; Werner H. Stemer; Ralph E. Locher
- Main IPC: C30B23/02
- IPC: C30B23/02 ; C30B25/02

Abstract:
A method is used for producing an SiC volume monocrystal by sublimation growth. Before the beginning of growth, an SiC seed crystal is arranged in a crystal growth region of a growth crucible and powdery SiC source material is introduced into an SiC storage region of the growth crucible. During the growth, by sublimation of the powdery SiC source material and by transport of the sublimated gaseous components into the crystal growth region, an SiC growth gas phase is produced there. The SiC volume monocrystal having a central center longitudinal axis grows by deposition from the SiC growth gas phase on the SiC seed crystal. The SiC seed crystal is heated substantially without bending during a heating phase before the beginning of growth, so that an SiC crystal structure with a substantially homogeneous course of lattice planes is provided in the SiC seed crystal.
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