Invention Grant
- Patent Title: Anti-reflective film and production method thereof
- Patent Title (中): 防反射膜及其制造方法
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Application No.: US13002699Application Date: 2009-09-01
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Publication No.: US08747994B2Publication Date: 2014-06-10
- Inventor: Takao Imaoku , Tokio Taguchi , Akiyoshi Fujii , Kazuhiko Tsuda
- Applicant: Takao Imaoku , Tokio Taguchi , Akiyoshi Fujii , Kazuhiko Tsuda
- Applicant Address: JP Osaka
- Assignee: Sharp Kabushiki Kaisha
- Current Assignee: Sharp Kabushiki Kaisha
- Current Assignee Address: JP Osaka
- Agency: Nixon & Vanderhye P.C.
- Priority: JP2008-238051 20080917
- International Application: PCT/JP2009/065271 WO 20090901
- International Announcement: WO2010/032610 WO 20100325
- Main IPC: B32B3/00
- IPC: B32B3/00 ; B32B3/30

Abstract:
The present invention provides an anti-reflective film that prevents wavelength dispersion from being applied to light transmitted through an anti-reflective film. The present invention is an anti-reflective film, which reduces reflection of visible light on a surface of a substrate by being mounted on the substrate, has a wavelength dispersion structure for applying first wavelength dispersion to visible light transmitting through the anti-reflective film, and contains a wavelength dispersion material for applying second wavelength dispersion to the visible light transmitting through the anti-reflective film, wherein visible light transmitted through the anti-reflective film has flat transmission wavelength dispersion in a visible light region.
Public/Granted literature
- US20110123777A1 ANTI-REFLECTIVE FILM AND PRODUCTION METHOD THEREOF Public/Granted day:2011-05-26
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