Invention Grant
US08748078B2 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern
有权
环状化合物，其制备方法，辐射敏感性组合物和形成抗蚀剂图案的方法
- Patent Title: Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern
- Patent Title (中): 环状化合物，其制备方法，辐射敏感性组合物和形成抗蚀剂图案的方法
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Application No.: US13393988Application Date: 2010-08-30
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Publication No.: US08748078B2Publication Date: 2014-06-10
- Inventor: Hiromi Hayashi , Masatoshi Echigo , Dai Oguro
- Applicant: Hiromi Hayashi , Masatoshi Echigo , Dai Oguro
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee Address: JP Tokyo
- Agency: Greenblum & Bernstein, P.L.C.
- Priority: JP2009-208554 20090909
- International Application: PCT/JP2010/064683 WO 20100830
- International Announcement: WO2011/030683 WO 20110317
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/028 ; C07C69/95 ; C07C39/12 ; C07C39/16
Abstract:
A cyclic compound represented by formula (1): wherein L, R1, R′, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.
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