Invention Grant
US08748215B2 Stacked oxide material, semiconductor device, and method for manufacturing the semiconductor device
有权
叠层氧化物材料,半导体器件以及半导体器件的制造方法
- Patent Title: Stacked oxide material, semiconductor device, and method for manufacturing the semiconductor device
- Patent Title (中): 叠层氧化物材料,半导体器件以及半导体器件的制造方法
-
Application No.: US12951224Application Date: 2010-11-22
-
Publication No.: US08748215B2Publication Date: 2014-06-10
- Inventor: Shunpei Yamazaki
- Applicant: Shunpei Yamazaki
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office, P.C.
- Agent Eric J. Robinson
- Priority: JP2009-270856 20091128
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L29/10 ; H01L27/12 ; H01L29/04 ; H01L29/24 ; H01L29/786 ; H01L21/02

Abstract:
One embodiment is a method for manufacturing a stacked oxide material, including the steps of forming an oxide component over a base component; forming a first oxide crystal component which grows from a surface toward an inside of the oxide component by heat treatment, and leaving an amorphous component just above a surface of the base component; and stacking a second oxide crystal component over the first oxide crystal component. In particular, the first oxide crystal component and the second oxide crystal component have common c-axes. Same-axis (axial) growth in the case of homo-crystal growth or hetero-crystal growth is caused.
Public/Granted literature
- US20110127521A1 STACKED OXIDE MATERIAL, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING THE SEMICONDUCTOR DEVICE Public/Granted day:2011-06-02
Information query
IPC分类: