Invention Grant
US08748215B2 Stacked oxide material, semiconductor device, and method for manufacturing the semiconductor device 有权
叠层氧化物材料,半导体器件以及半导体器件的制造方法

Stacked oxide material, semiconductor device, and method for manufacturing the semiconductor device
Abstract:
One embodiment is a method for manufacturing a stacked oxide material, including the steps of forming an oxide component over a base component; forming a first oxide crystal component which grows from a surface toward an inside of the oxide component by heat treatment, and leaving an amorphous component just above a surface of the base component; and stacking a second oxide crystal component over the first oxide crystal component. In particular, the first oxide crystal component and the second oxide crystal component have common c-axes. Same-axis (axial) growth in the case of homo-crystal growth or hetero-crystal growth is caused.
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