Invention Grant
- Patent Title: Photocurable resin composition
- Patent Title (中): 光固化树脂组合物
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Application No.: US13383324Application Date: 2010-07-14
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Publication No.: US08748502B2Publication Date: 2014-06-10
- Inventor: Yoko Shibasaki , Masao Arima
- Applicant: Yoko Shibasaki , Masao Arima
- Applicant Address: JP Tokyo
- Assignee: Taiyo Holdings Co., Ltd.
- Current Assignee: Taiyo Holdings Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2009-166925 20090715
- International Application: PCT/JP2010/004572 WO 20100714
- International Announcement: WO2011/007566 WO 20110120
- Main IPC: C08F2/50
- IPC: C08F2/50 ; B29C71/04 ; C08F2/46 ; A61L2/08 ; A61L24/00 ; C08G61/04

Abstract:
Disclosed is a photocurable resin composition which comprises a photopolymerization initiator having two oxime ester groups in the molecule, a resin containing a carboxyl group, and a compound having two or more ethylenically unsaturated groups in the molecule. The composition can achieve high sensitivity, can provide a dried coating film having excellent touch dryness of fingers, can prevent the generation of an out gas during curing or the like, and can achieve all of excellent alignment accuracy, high productivity and high reliability in the formation of a solder resist for a printed wiring board or the like.
Public/Granted literature
- US20120111620A1 PHOTOCURABLE RESIN COMPOSITION Public/Granted day:2012-05-10
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